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Photolithography Process near the Diffraction Limit
Author：
Wu Qiang et al.
Impression：1-5
ISBN：9787302537427
Subject：Computer Science
Publication Date：2020.02.01
Page Count：692
The author’s nearly 20 years of learning achievements and R&D experience have been compiled into this book. This book takes the photolithography process as the main line, organically and closely integrating the photolithography equipment, photolithography material, the theoretical calculation of photolithography imaging, various modeling ideas and derivation in photolithography process, the requirements of technical development of chip manufacturing and the requirements of various parameters of photolithography process, which gives the readers an overall picture.
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